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Effect of Thermal Deformation on Imaging Performance for 16 nm Extreme Ultraviolet Lithography Objective

Authors :
刘岩 Liu Yan
刘丽辉 Liu Lihui
李艳秋 Li Yanqiu
Source :
Acta Optica Sinica. 39:0122001
Publication Year :
2019
Publisher :
Shanghai Institute of Optics and Fine Mechanics, 2019.

Subjects

Subjects :
Materials science
business.industry
Extreme ultraviolet lithography
Thermal deformation
Optoelectronics
business
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials

Details

ISSN :
02532239
Volume :
39
Database :
OpenAIRE
Journal :
Acta Optica Sinica
Accession number :
edsair.doi...........cbb5f4077e718dbd192bb2179551f5d5
Full Text :
https://doi.org/10.3788/aos201939.0122001
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