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Optical characterization of nanocrystalline boron nitride thin films grown by atomic layer deposition
- Source :
- Thin Solid Films. 571:51-55
- Publication Year :
- 2014
- Publisher :
- Elsevier BV, 2014.
-
Abstract
- Boron nitride thin films were grown on sapphire and Si substrates by atomic layer deposition from triethylborane (TEB) and NH3 precursors in the temperature range of 500 to 900 °C. By varying the TEB exposure the film thickness can be controlled with
- Subjects :
- Materials science
Metals and Alloys
Analytical chemistry
Surfaces and Interfaces
Nanocrystalline material
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
Atomic layer deposition
symbols.namesake
Carbon film
chemistry
Boron nitride
Materials Chemistry
Sapphire
symbols
Fourier transform infrared spectroscopy
Thin film
Raman spectroscopy
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 571
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........cd0d287f9e24fd9a4612d10e02b0603d
- Full Text :
- https://doi.org/10.1016/j.tsf.2014.09.065