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Minimizing residual stress of aluminum nitride (AlN) thin films using multi-step deposition of DC pulsed sputtering

Authors :
Wei-Lun Chen
Shang Shian Yang
Ning Hsiu Yuan
Wei Yu Zhou
Yu-Pu Yang
Hsiao-Han Lo
Peter J. Wang
Walter Lai
Yiin-kuen Fuh
Tomi T. Li
Source :
2022 China Semiconductor Technology International Conference (CSTIC).
Publication Year :
2022
Publisher :
IEEE, 2022.

Details

Database :
OpenAIRE
Journal :
2022 China Semiconductor Technology International Conference (CSTIC)
Accession number :
edsair.doi...........cddd7e4d1d43201ef88ab89b39a3b0bd

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