Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography

Authors :: Ryosuke Imoto
Tadashi Ando
Hiroki Uchida
Takao Okabe
Jun Taniguchi
Source :: Journal of Photopolymer Science and Technology. 34:139-144
Publication Year :: 2021
Publisher :: Technical Association of Photopolymers, Japan, 2021.

Subjects :: Molecular dynamics
Materials science
Polymers and Plastics
Resist
law
Scientific method
Organic Chemistry
Materials Chemistry
Nanotechnology
Nanoimprint lithography
law.invention

Tools