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Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography
- Source :
- Journal of Photopolymer Science and Technology. 34:139-144
- Publication Year :
- 2021
- Publisher :
- Technical Association of Photopolymers, Japan, 2021.
Details
- ISSN :
- 13496336 and 09149244
- Volume :
- 34
- Database :
- OpenAIRE
- Journal :
- Journal of Photopolymer Science and Technology
- Accession number :
- edsair.doi...........cff939f216edb06eb8354b650d21ec71