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In situ synchrotron X-ray diffraction study on epitaxial-growth dynamics of III–V semiconductors

Authors :
Masamitu Takahasi
Source :
Japanese Journal of Applied Physics. 57:050101
Publication Year :
2018
Publisher :
IOP Publishing, 2018.

Subjects

Subjects :
010302 applied physics
In situ
Materials science
Physics and Astronomy (miscellaneous)
business.industry
Synchrotron X-Ray Diffraction
General Engineering
Analytical chemistry
General Physics and Astronomy
02 engineering and technology
021001 nanoscience & nanotechnology
Epitaxy
01 natural sciences
Semiconductor
0103 physical sciences
0210 nano-technology
business

Details

ISSN :
13474065 and 00214922
Volume :
57
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........d097764811fb2670fedd56e8d5b9d258
Full Text :
https://doi.org/10.7567/jjap.57.050101
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