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A New High-Efficiency and Low-Damage Polishing Process of HgCdTe Wafer

Authors :
Jie Wanqi
Yan Li
Renke Kang
Hang Gao
Source :
Materials and Manufacturing Processes. 27:229-232
Publication Year :
2012
Publisher :
Informa UK Limited, 2012.

Abstract

HgCdTe crystals have been accepted as a very important material of infrared detectors, and due to their soft-brittle nature, machining HgCdTe wafers is a challenge in the field of ultraprecision ma...

Subjects

Subjects :
Materials science
business.industry
Mechanical Engineering
Polishing
Surface finish
Industrial and Manufacturing Engineering
Optics
Machining
Mechanics of Materials
Scientific method
Chemical-mechanical planarization
Optoelectronics
General Materials Science
Wafer
business

Details

ISSN :
15322475 and 10426914
Volume :
27
Database :
OpenAIRE
Journal :
Materials and Manufacturing Processes
Accession number :
edsair.doi...........d0b31b4c1faf7e07e702cb9137ca6196

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