Synthesis and analysis of titanium nitride thin film in atmospheric thermal plasma torch

In this paper, a layer of titanium nitride deposited on titanium substrate. Titanium nitride produced by the reaction of titanium and nitrogen plasma that generated by plasma torch, then molten particles of titanium nitride huddled on to the substrate. Sample produced by this method analyzed with Raman scattering spectroscopy and X-ray Diffraction witch confirm titanium nitride production. Vickers hardness was measured using the layer that was at best 1150 HV0.3. To study the surface of layer, light microscopy and electron microscopy (SEM) and AFM were used.