Influence of Reducing Agent on Properties of Thin WS2 Nanosheets Prepared by Sulfurization of Atomic Layer-Deposited WO3

Authors :: Aleksandr S. Slavich
Maxim G. Kozodaev
Roman I. Romanov
Andrey M. Markeev
Sergey S. Zarubin
Source :: The Journal of Physical Chemistry C. 124:28169-28177
Publication Year :: 2020
Publisher :: American Chemical Society (ACS), 2020.
Abstract: Atomically thin tungsten disulfide (WS2) film is a promising material for flexible electronics and optoelectronics. The ability of its controllable synthesis over a large area is an essential task ...

Subjects :: chemistry.chemical_compound
General Energy
Materials science
chemistry
Reducing agent
Tungsten disulfide
Nanotechnology
Physical and Theoretical Chemistry
equipment and supplies
Layer (electronics)
Flexible electronics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials

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