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High-performance CMOS circuits fabricated by excimer-laser-annealed poly-Si TFTs on glass substrates

Authors :
K. Ohgata
F. Takeuchi
Nobuo Sasaki
Yasuyoshi Mishima
K. Yoskino
M. Takei
Source :
IEEE Electron Device Letters. 22:89-91
Publication Year :
2001
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2001.

Abstract

High-performance CMOS circuits are fabricated from excimer-laser-annealed poly-Si TFTs on a glass substrate (300/spl times/300 mm). The propagation delay time of the 121 stage CMOS ring oscillators with 0.5 /spl mu/m gate length is 0.18 nsec at 5 V supply voltage. The maximum operating frequency of the 40-stage shift registers with 1 /spl mu/m gate length is 133 MHz at 5 V supply voltage. This value is high enough for peripheral CMOS circuits with line-at-a-time addressing.

Details

ISSN :
15580563 and 07413106
Volume :
22
Database :
OpenAIRE
Journal :
IEEE Electron Device Letters
Accession number :
edsair.doi...........d34879c703d7ff88eee70ed88251ac11
Full Text :
https://doi.org/10.1109/55.902841