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Phosphorus Vacancy as a Deep Level in AlInP Layers

Authors :
Jung Ting Chang
Shih Chang Lee
Yu–Rue Wu
Tsang Jou Li
Wei Jer Sung
Wei-I Lee
Tzu Chi Wen
Source :
Japanese Journal of Applied Physics. 39:L567
Publication Year :
2000
Publisher :
IOP Publishing, 2000.

Abstract

Deep levels in AlInP layers, grown by metal-organic chemical vapor deposition (MOCVD) with various V/III mole ratios, have been carefully investigated by deep-level transient spectroscopy (DLTS). A deep level originating from phosphorus vacancy was observed with the activation energy of 0.65 eV. Examining this phosphorus-vacancy-related deep level provided a relatively simple means of understanding the phosphorus vacancy in AlInP, thus allowing us to determine an appropriate V/III mole ratio for growing AlInP.

Details

ISSN :
13474065 and 00214922
Volume :
39
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........d35f7c3c6011629f37e63723fba495b9
Full Text :
https://doi.org/10.1143/jjap.39.l567