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Optically pumped Si-based edge-emitting GeSn laser
- Source :
- Conference on Lasers and Electro-Optics.
- Publication Year :
- 2017
- Publisher :
- OSA, 2017.
-
Abstract
- We present double heterostructure GeSn edge emitting laser. The structure was grown on a Si substrate using a commercial chemical vapor deposition with GeH 4 and SnCl 4 . The lasing threshold of 68 KW/cm2 at 10K and maximum laser operating temperature of 110 K was achieved.
- Subjects :
- Materials science
business.industry
Physics::Optics
02 engineering and technology
Chemical vapor deposition
Edge (geometry)
Double heterostructure
021001 nanoscience & nanotechnology
Laser
01 natural sciences
law.invention
010309 optics
Optics
Si substrate
Operating temperature
law
0103 physical sciences
Optoelectronics
Physics::Atomic Physics
0210 nano-technology
business
Refractive index
Lasing threshold
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- Conference on Lasers and Electro-Optics
- Accession number :
- edsair.doi...........d5c28331571ecc62b99d6f4f9dc8d010
- Full Text :
- https://doi.org/10.1364/cleo_si.2017.sw4c.1