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The ESD protection characteristic and low-frequency noise analysis of GaN Schottky barrier diode with fluorine-based plasma treatment
- Source :
- Microelectronics Reliability. 59:44-48
- Publication Year :
- 2016
- Publisher :
- Elsevier BV, 2016.
-
Abstract
- In this work, the electrostatic discharge (ESD) protection of Schottky diode with fluorine-based plasma treatment is proven by transmission-line pulse (TLP) measurement. And the low-frequency noise (LFN) is used to determine the activation energy (E a ) of a GaN Schottky diode with plasma treatment. This experiment compares the Schottky diode with CF 4 and CHF 3 plasma treatment, respectively with a standard Schottky diode to determine the characteristics and to assess the low-frequency noise and the ESD protection ability.
- Subjects :
- Materials science
Schottky barrier
Infrasound
Analytical chemistry
chemistry.chemical_element
Plasma treatment
02 engineering and technology
Activation energy
01 natural sciences
0103 physical sciences
Electrical and Electronic Engineering
Safety, Risk, Reliability and Quality
010302 applied physics
Electrostatic discharge
business.industry
Schottky diode
021001 nanoscience & nanotechnology
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
chemistry
Fluorine
Optoelectronics
0210 nano-technology
business
Noise (radio)
Subjects
Details
- ISSN :
- 00262714
- Volume :
- 59
- Database :
- OpenAIRE
- Journal :
- Microelectronics Reliability
- Accession number :
- edsair.doi...........d66eedade3628aced51853b157d38781
- Full Text :
- https://doi.org/10.1016/j.microrel.2016.01.014