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The ESD protection characteristic and low-frequency noise analysis of GaN Schottky barrier diode with fluorine-based plasma treatment

Authors :
Feng-Tso Chien
Ji-Fan Chi
Kuan-Liang Cho
Hsien-Chin Chiu
Chia-Yi Chu
Hsuan-Ling Kao
Source :
Microelectronics Reliability. 59:44-48
Publication Year :
2016
Publisher :
Elsevier BV, 2016.

Abstract

In this work, the electrostatic discharge (ESD) protection of Schottky diode with fluorine-based plasma treatment is proven by transmission-line pulse (TLP) measurement. And the low-frequency noise (LFN) is used to determine the activation energy (E a ) of a GaN Schottky diode with plasma treatment. This experiment compares the Schottky diode with CF 4 and CHF 3 plasma treatment, respectively with a standard Schottky diode to determine the characteristics and to assess the low-frequency noise and the ESD protection ability.

Details

ISSN :
00262714
Volume :
59
Database :
OpenAIRE
Journal :
Microelectronics Reliability
Accession number :
edsair.doi...........d66eedade3628aced51853b157d38781
Full Text :
https://doi.org/10.1016/j.microrel.2016.01.014