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Atomic Layer Deposition of PbI2 Thin Films

Authors :
Georgi Popov
Mikko Ritala
Markku Leskelä
Timo Hatanpää
Marianna Kemell
Jyrki Räisänen
Kenichiro Mizohata
Marko Vehkamäki
Miika Mattinen
Source :
Chemistry of Materials. 31:1101-1109
Publication Year :
2019
Publisher :
American Chemical Society (ACS), 2019.

Abstract

Atomic layer deposition (ALD) enables the deposition of numerous materials in thin film form, yet there are no ALD processes for metal iodides. Herein, we demonstrate an ALD process for PbI2, a met...

Subjects

Subjects :
Materials science
General Chemical Engineering
02 engineering and technology
General Chemistry
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
0104 chemical sciences
Metal
Atomic layer deposition
Chemical engineering
visual_art
Materials Chemistry
visual_art.visual_art_medium
Deposition (phase transition)
Thin film
0210 nano-technology

Details

ISSN :
15205002 and 08974756
Volume :
31
Database :
OpenAIRE
Journal :
Chemistry of Materials
Accession number :
edsair.doi...........d987d8f22bd07f02b1b24f7249b1aeb3
Full Text :
https://doi.org/10.1021/acs.chemmater.8b04969
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