Application of Emission Spectroscopy for Profile Control during Oxygen RIE of Thick Photoresist

Authors :: R. F. Shuman
Randy R. Ross
B. R. Soller
Source :: Journal of The Electrochemical Society. 131:1353-1356
Publication Year :: 1984
Publisher :: The Electrochemical Society, 1984.
Abstract: Description de la gravure reactive par ions oxygene en technologie planaire d'une couche de photoresist dans un systeme de resist a 3 couches. Vitesses d'attaque verticale et laterale et degre d'isotropie du profil. Les spectres d'emission optique du plasma d'oxygene revelent la presence d'atomes O et de molecules ionisees O 2 + . Le degre d'isotropie resultant de variations de la puissance RF et de la pression d'oxygene peut etre determine en controlant le rapport des intensites d'emission de O/O 2 +

Subjects :: Renewable Energy, Sustainability and the Environment
business.industry
Chemistry
Analytical chemistry
chemistry.chemical_element
Photoresist
Condensed Matter Physics
Oxygen
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Optics
Materials Chemistry
Electrochemistry
Emission spectrum
Reactive-ion etching
business
Thick photoresist
Luminescence

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