Analysis and fabrication of antireflection coating with ultralow residual reflectance for single wavelength

Authors :: 王日 Ri Wang
沈正详 Zhengxiang Shen
刘丹丹 Dandan Liu
王占山 Zhanshan Wang
陈德应 Deying Chen
马彬 Bin Ma
季一勤 Yiqin Ji
姜福灏 Fuhao Jiang
刘华松 Huasong Liu
Source :: Chinese Optics Letters. 8:207-209
Publication Year :: 2010
Publisher :: Shanghai Institute of Optics and Fine Mechanics, 2010.

Subjects :: Wavelength
Optics
Fabrication
Materials science
business.industry
Antireflection coating
Optoelectronics
Electrical and Electronic Engineering
business
Residual
Reflectivity
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials

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