Back to Search
Start Over
Depth Profile of Impurity Phase in Wide-Bandgap Cu(In1−x,Gax)Se2 Film Fabricated by Three-Stage Process
- Source :
- Journal of Electronic Materials. 47:4944-4949
- Publication Year :
- 2018
- Publisher :
- Springer Science and Business Media LLC, 2018.
-
Abstract
- For copper indium gallium selenide [Cu(In1−x,Gax)Se2, CIGS]-based solar cells, defect states or impurity phase always form due to both the multinary compositions of CIGS film and the difficulty of controlling the growth process, especially for high Ga concentration. To further improve device performance, it is important to understand such formation of impurity phase or defect states during fabrication. In the work presented herein, the formation mechanism of impurity phase Cu2−δSe and its depth profile in CIGS film with high Ga content, in particular CuGaSe2 (i.e., CGS), were investigated by applying different growth conditions (i.e., normal three-stage process and two-cycle three-stage process). The results suggest that impurity phase Cu2−δSe is distributed nonuniformly in the film because of lack of Ga diffusion. The formed Cu2−δSe can be removed by etching the as-deposited CGS film with bromine-methanol solution, resulting in improved device performance.
- Subjects :
- Fabrication
Materials science
Band gap
02 engineering and technology
01 natural sciences
law.invention
chemistry.chemical_compound
Impurity
law
Etching
Phase (matter)
0103 physical sciences
Solar cell
Materials Chemistry
Electrical and Electronic Engineering
010302 applied physics
business.industry
021001 nanoscience & nanotechnology
Condensed Matter Physics
Copper indium gallium selenide solar cells
Electronic, Optical and Magnetic Materials
chemistry
Optoelectronics
0210 nano-technology
business
Copper indium gallium selenide
Subjects
Details
- ISSN :
- 1543186X and 03615235
- Volume :
- 47
- Database :
- OpenAIRE
- Journal :
- Journal of Electronic Materials
- Accession number :
- edsair.doi...........dbb32fb4f7a24772fc7011aa7a244eb9
- Full Text :
- https://doi.org/10.1007/s11664-018-6120-1