Characterization of thermally stable W/Ni multilayers by X-rays and cross-sectional transmission electron microscopy

W/Ni multilayer structures (MLS) composed of 5 and 10 bilayers, with composition W(15 A)/Ni(55 A), have been deposited on float glass substrate using ion-beam sputtering. X-ray reflectivity and wide-angle X-ray diffraction techniques have been used to study their interface characteristics, such as layer thickness, interface roughness and change in structural parameters. The fabricated MLS were found to be oriented along (111) of Ni having superlattice modulation perpendicular to the film plane. Thermal annealing studies on these multilayers showed that these were stable up to 500 °C. Cross-sectional transmission electron microscopy and selected area electron diffraction studies on as-deposited W/Ni MLS of 10 bilayers revealed well formed interfaces without any correlated roughness. The thicknesses of different layers were found to vary along the film thickness.