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Design for Back-end-of-Line Processes

Authors :
Carolyn D. White
Charles C. Chung
Alissa M. Fitzgerald
Source :
Microsystems and Nanosystems ISBN: 9783030617080
Publication Year :
2021
Publisher :
Springer International Publishing, 2021.

Abstract

Completed wafers from the foundry go through the back-end-of-line (BEOL) to become individually packaged and tested die. The back end process imposes requirements on the MEMS die design and wafer layout, which are best accommodated in the early development stages. This chapter describes BEOL activities and points out some of the requirements imposed on MEMS die design and wafer layout.

Details

ISBN :
978-3-030-61708-0
ISBNs :
9783030617080
Database :
OpenAIRE
Journal :
Microsystems and Nanosystems ISBN: 9783030617080
Accession number :
edsair.doi...........ddac4ce89bd4f8ecd06e0ccd9cefb07b