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Mechanism for ordering in SiGe films with reconstructed surface
- Source :
- Applied Physics Letters. 71:1174-1176
- Publication Year :
- 1997
- Publisher :
- AIP Publishing, 1997.
-
Abstract
- A model of the ordering mechanism in SiGe films is developed to explain the occurrence of two types of ordered structures. We investigate the stability of ordered structures by strain energy calculation. It is suggested that atomic diffusion, which is enhanced by strain in a film, influences the formation of ordered structures. The process of atomic exchange that forms the ordered structure at a reconstructed surface during growth is also discussed.
- Subjects :
- Semiconductor thin films
Atomic diffusion
Surface (mathematics)
Condensed Matter::Materials Science
Crystallography
Materials science
Physics and Astronomy (miscellaneous)
Strain (chemistry)
Condensed matter physics
Semiconductor materials
Crystal structure
Surface reconstruction
Strain energy
Subjects
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 71
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi...........ddac7dad2cb65748a8970920f8157c13
- Full Text :
- https://doi.org/10.1063/1.119617