Effect of reaction conditions on the basal resistivity of graphite-acceptor intercalation compounds

In this paper we explore the effect of variations in reaction conditions on the basal resistivity ϱ a of graphite intercalated with HNO 3 and AsF 5 . In the former case, the reaction rate is varied over a wide range by diluting the reactant vapor with inert gas. In the latter case, several variations which might be expected to alter the fractional ionization are explored. None of these treatments produces a significant effect, from which we conclude that intrinsic values of ϱ a are being obtained with these compounds. Further improvements in ϱ a will therefore rely on development of new materials.