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Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass
- Source :
- Vacuum. 68:49-55
- Publication Year :
- 2002
- Publisher :
- Elsevier BV, 2002.
-
Abstract
- Nano-crystalline diamond films have been prepared on glass substrate in argon and methane environments by microwave plasma chemical vapor deposition. The suitable processing parameters are methane concentration 3% in argon; total deposition pressure 13.3 kPa; substrate temperature 500°C heated by plasma. In this film, the grain size is
- Subjects :
- Materials science
Hybrid physical-chemical vapor deposition
Ion plating
Mineralogy
Diamond
Sputter deposition
engineering.material
Condensed Matter Physics
Surfaces, Coatings and Films
Carbon film
Chemical engineering
Plasma-enhanced chemical vapor deposition
engineering
Thin film
Instrumentation
Plasma processing
Subjects
Details
- ISSN :
- 0042207X
- Volume :
- 68
- Database :
- OpenAIRE
- Journal :
- Vacuum
- Accession number :
- edsair.doi...........e16c78099800b76c990f547ad396e1de