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Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass

Authors :
Kong Xiang
Duan Xiao-feng
Yang Wu-Bao
Yang Si-Ze
Lü Fan-Xiu
Source :
Vacuum. 68:49-55
Publication Year :
2002
Publisher :
Elsevier BV, 2002.

Abstract

Nano-crystalline diamond films have been prepared on glass substrate in argon and methane environments by microwave plasma chemical vapor deposition. The suitable processing parameters are methane concentration 3% in argon; total deposition pressure 13.3 kPa; substrate temperature 500°C heated by plasma. In this film, the grain size is

Details

ISSN :
0042207X
Volume :
68
Database :
OpenAIRE
Journal :
Vacuum
Accession number :
edsair.doi...........e16c78099800b76c990f547ad396e1de