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Effect of Passivation on Increasing of AlGaN/GaN HEMT Gate Reverse Leakage
- Source :
- 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings.
- Publication Year :
- 2006
- Publisher :
- IEEE, 2006.
-
Abstract
- AlGaN/GaN HEMT gate leakage increasing induced by passivation was investigated by employing double gate surface leakage test structure, circle and rectangular Schottky contact structure and metal float gate structure. It was demonstrated that surface leakage is not a major contributor to increasing of gate leakage. Increase of gate leakage depends on augmenting of Schottky contact edge effect and inhibiting "visual gate" between gate and drain
- Subjects :
- Materials science
Passivation
business.industry
Schottky barrier
Gate dielectric
Time-dependent gate oxide breakdown
Hardware_PERFORMANCEANDRELIABILITY
High-electron-mobility transistor
Hardware_GENERAL
Gate oxide
Hardware_INTEGRATEDCIRCUITS
Optoelectronics
Hardware_ARITHMETICANDLOGICSTRUCTURES
Metal gate
business
Hardware_LOGICDESIGN
Leakage (electronics)
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings
- Accession number :
- edsair.doi...........e317ec3ca2ce3d887ec113af7fdb0c33
- Full Text :
- https://doi.org/10.1109/icsict.2006.306568