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Effect of electron injection on the parameters of a pulsed planar magnetron
- Source :
- Vacuum. 159:200-203
- Publication Year :
- 2019
- Publisher :
- Elsevier BV, 2019.
-
Abstract
- We have explored the influence of supplementary electron injection on the operational parameters of a planar magnetron operating in repetitively pulsed mode (repetition rate 300 Hz, pulse duration 50–100 μs). The supplementary electron flux was provided from the plasma of an auxiliary hollow-cathode glow discharge and was accelerated directly into the magnetron cathode layer. We show that this supplementary electron injection eliminates magnetron ignition delay and increases the sputtered ion current from the magnetron plasma.
- Subjects :
- 010302 applied physics
Glow discharge
Materials science
business.industry
Pulse duration
Ion current
02 engineering and technology
Plasma
021001 nanoscience & nanotechnology
Condensed Matter Physics
01 natural sciences
Cathode
Surfaces, Coatings and Films
law.invention
law
Electron injection
0103 physical sciences
Cavity magnetron
Optoelectronics
0210 nano-technology
business
Instrumentation
Layer (electronics)
Subjects
Details
- ISSN :
- 0042207X
- Volume :
- 159
- Database :
- OpenAIRE
- Journal :
- Vacuum
- Accession number :
- edsair.doi...........e360deedbe95eb1a33a6978e7412006e