Photoelectrochemical study of electrodeposited TiO2 thin films onto F:SnO2 substrates

TiO2 thin films have been effectively fused onto F:SnO2 (FTO) substrates via the electrodeposition method. The influence of deposition temperature on the synthesis of F:SnO2 substrates and relative information of as-deposited and annealed TiO2 thin films have been studied. Novel TiO2 microspheres are detected on F:SnO2 substrates at an optimized electrodeposition potential. Raman bands approve the creation of single-anatase-phase TiO2. The optimized deposition surroundings show a decrease in the band gap of F:SnO2 substrates and TiO2 thin films. The determined photoelectrochemical properties of annealed TiO2 thin films indicate a fill factor of 51% and power conversion efficiency of 0.15% for application in solar cells.