Doped SiO2deposition from TMP in APCVD

MLA

G. U. Pignatel, et al. “Doped SiO2deposition from TMP in APCVD.” European Transactions on Telecommunications, vol. 1, Mar. 1990, pp. 167–72. EBSCOhost, https://doi.org/10.1002/ett.4460010215.

APA

G. U. Pignatel, J. C. Sisson, N. M. Gralenski, & L. D. Bartholomew. (1990). Doped SiO2deposition from TMP in APCVD. European Transactions on Telecommunications, 1, 167–172. https://doi.org/10.1002/ett.4460010215

Chicago

G. U. Pignatel, J. C. Sisson, N. M. Gralenski, and L. D. Bartholomew. 1990. “Doped SiO2deposition from TMP in APCVD.” European Transactions on Telecommunications 1 (March): 167–72. doi:10.1002/ett.4460010215.