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Antireflective subwavelength structures on crystalline Si fabricated using directly formed anodic porous alumina masks

Authors :
Yoshio Ohshita
Yoshiaki Kanamori
Homare Fujii
Koji Arafune
Masafumi Yamaguchi
Hitoshi Sai
Hiroo Yugami
Source :
Applied Physics Letters. 88:201116
Publication Year :
2006
Publisher :
AIP Publishing, 2006.

Abstract

A simple fabrication technique for subwavelength structured (SWS) surfaces by means of anodic porous alumina masks directly formed on Si substrates was proposed and demonstrated. By this technique, SWS surfaces were fabricated on polished single-crystalline Si and chemically etched as-cut multicrystalline Si wafers. Smoothly tapered SWS surfaces with a periodicity of 100nm and a height of 300–400nm were obtained. A low reflectivity below 1% was observed from 300to1000nm for both of the wafers, in agreement with numerical simulation. After thermal annealing at 800°C, the reflectivity of the SWS surface increased to 3%.

Details

ISSN :
10773118 and 00036951
Volume :
88
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........e76c42d484596361c089194dc7a77029
Full Text :
https://doi.org/10.1063/1.2205173