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Deposition dynamics of droplet-free Si nanoparticles in Ar gas using laser ablation
- Source :
- Applied Surface Science. :674-678
- Publication Year :
- 2002
- Publisher :
- Elsevier BV, 2002.
-
Abstract
- Droplet-free deposition of Si nanoparticle films has been studied applying time-resolved imaging of Si nanoparticles formed by laser ablation of Si targets in Ar gas. We found that Si nanoparticles can be deposited not only on substrates facing to the targets but also on substrates placed beside the target. We further confirmed using a scanning tunneling microscope (STM), Si nanoparticles with sizes of 5–8 nm are deposited on substrates placed beside the target and using a scanning electron microscope (SEM) on the substrates, no droplets are observed.
- Subjects :
- Laser ablation
Materials science
Photoluminescence
Silicon
business.industry
Scanning electron microscope
Analytical chemistry
General Physics and Astronomy
Nanoparticle
chemistry.chemical_element
Surfaces and Interfaces
General Chemistry
Condensed Matter Physics
Surfaces, Coatings and Films
law.invention
Pulsed laser deposition
chemistry
law
Optoelectronics
Scanning tunneling microscope
business
Deposition (law)
Subjects
Details
- ISSN :
- 01694332
- Database :
- OpenAIRE
- Journal :
- Applied Surface Science
- Accession number :
- edsair.doi...........e790fd6492e2a5e3f0c127eb86c2963a