Growth conditions of semi and non-polar GaN on Si with Er2O3 buffer layer

The GaN was grown on Si(100) with Er 2 O 3 (110) buffer by metal organic chemical vapor deposition (MOCVD). The results showed the polycrystalline nature of the layers with dominant non-polar (11–20) and semi-polar (10–13) orientations. GaN was formed in a two step process regime: low temperature growth was followed by high temperature growth regime. At a low temperature GaN tends to crystalize with dominant non-polar (11–20) orientation, while high temperature leads to preferential semi-polar (10–13) orientation growth. Additionally, the effects of parameters such as growth temperature, V/III-ratio and type of carrier gases on structural, morphological and optical properties of GaN was discussed in the current work.