Expected performance of digital scanner and the potential application for advanced semiconductor fabrication

MLA

Yoji Watanabe, et al. “Expected Performance of Digital Scanner and the Potential Application for Advanced Semiconductor Fabrication.” Optical and EUV Nanolithography XXXVI, Apr. 2023. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........ec4fda250b7401c4c0166c6b01d7f229&authtype=sso&custid=ns315887.

APA

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Steve Renwick, Noriyuki Hirayanagi, & Bausan Yuan. (2023). Expected performance of digital scanner and the potential application for advanced semiconductor fabrication. Optical and EUV Nanolithography XXXVI.

Chicago

Yoji Watanabe, Yuho Kanaya, Yusuke Saito, Toshiaki Sakamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, et al. 2023. “Expected Performance of Digital Scanner and the Potential Application for Advanced Semiconductor Fabrication.” Optical and EUV Nanolithography XXXVI, April. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........ec4fda250b7401c4c0166c6b01d7f229&authtype=sso&custid=ns315887.