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Characteristics of SnO2: F films by CMD (chemical mist deposition) method

Authors :
Koumei Kato
Hideyo Iida
Toshio Mishuku
Yutaka Hayashi
Atsuo Ito
Source :
Electrical Engineering in Japan. 109:19-27
Publication Year :
1989
Publisher :
Wiley, 1989.

Subjects

Subjects :
Materials science
Chemical engineering
Mist
Energy Engineering and Power Technology
Electrical and Electronic Engineering
Deposition (chemistry)

Details

ISSN :
04247760
Volume :
109
Database :
OpenAIRE
Journal :
Electrical Engineering in Japan
Accession number :
edsair.doi...........ec6f16dd7d26e8272586fd988483c2d7
Full Text :
https://doi.org/10.1002/eej.4391090303
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