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Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography
- Source :
- Chemistry of Materials. 32:2399-2407
- Publication Year :
- 2020
- Publisher :
- American Chemical Society (ACS), 2020.
-
Abstract
- The challenges of patterning next-generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost-effective size ...
- Subjects :
- Materials science
business.industry
General Chemical Engineering
02 engineering and technology
General Chemistry
Integrated circuit
010402 general chemistry
021001 nanoscience & nanotechnology
Line edge roughness
01 natural sciences
0104 chemical sciences
law.invention
Semiconductor industry
law
Hardware_INTEGRATEDCIRCUITS
Materials Chemistry
Copolymer
Optoelectronics
0210 nano-technology
business
Lithography
Hardware_LOGICDESIGN
Subjects
Details
- ISSN :
- 15205002 and 08974756
- Volume :
- 32
- Database :
- OpenAIRE
- Journal :
- Chemistry of Materials
- Accession number :
- edsair.doi...........eccd82139bdc7d1e613ea58b27814ad3