Back to Search
Start Over
Computational lithographic study of 0.55 NA EUV single patterning for metal layers for the 2nm logic node and beyond
- Source :
- DTCO and Computational Patterning.
- Publication Year :
- 2022
- Publisher :
- SPIE, 2022.
Details
- Database :
- OpenAIRE
- Journal :
- DTCO and Computational Patterning
- Accession number :
- edsair.doi...........ed520e0239d018b55676d4f6c1017cc8
- Full Text :
- https://doi.org/10.1117/12.2614225