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Hydrothermal formation of controllable hexagonal holes and Er2O3/Er2O3-RGO particles on silicon wafers toward superhydrophobic surfaces
- Source :
- Journal of Colloid and Interface Science. 580:768-775
- Publication Year :
- 2020
- Publisher :
- Elsevier BV, 2020.
-
Abstract
- In this work, controllable hexagonal holes and distributed Er2O3/Er2O3- graphene particles are fabricated on silicon wafers using a straightforward, hydrofluoric, acid-free, and strong alkali-free hydrothermal method. As long as erbium nitrate hydrate and urea coexist in the reaction mixture, silicon wafers can be synthesized successfully using controllable hexagonal hole structures that are regulated by hydrothermal temperature and the addition of graphene oxide and hexadecyl trimethyl ammonium bromide to the reaction mixture. Correspondingly, the wettability of these silicon wafers also is controllable due to the structure that can be changed from hydrophilic (89.3°) to superhydrophobic (153.1°). In short, this work not only provides a simple and nontoxic approach for preparing hexagonal hole structured silicon wafers, but also produces superhydrophobic silicon wafers that potentially can be applied for corrosion-resistant coatings, oil-water separation, and other fields.
- Subjects :
- Ammonium bromide
Materials science
Hexagonal crystal system
Graphene
Oxide
chemistry.chemical_element
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
Hydrothermal circulation
0104 chemical sciences
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
law.invention
Biomaterials
Erbium
chemistry.chemical_compound
Colloid and Surface Chemistry
chemistry
Chemical engineering
law
Wafer
Wetting
0210 nano-technology
Subjects
Details
- ISSN :
- 00219797
- Volume :
- 580
- Database :
- OpenAIRE
- Journal :
- Journal of Colloid and Interface Science
- Accession number :
- edsair.doi...........f4a42f194da7596dff1902420d65f61c