Back to Search
Start Over
Fabrication of silicon-based two-dimensional photonic crystals
- Source :
- Microsystem Technologies. 12:919-922
- Publication Year :
- 2006
- Publisher :
- Springer Science and Business Media LLC, 2006.
-
Abstract
- Both triangular lattice and square lattice photonic crystals with lattice constant 400 nm and the radius 200 nm of the air pores in the silicon substrate have been designed, fabricated and realized. The processes of the fabrication of the two-dimensional photonic crystals, based on silicon, including mask making, electron-beam lithography, and inductively coupled plasma etching are introduced.
- Subjects :
- Materials science
Silicon
Physics::Instrumentation and Detectors
business.industry
Hybrid silicon laser
Physics::Optics
chemistry.chemical_element
Substrate (electronics)
Condensed Matter Physics
Computer Science::Other
Electronic, Optical and Magnetic Materials
Lattice constant
Optics
chemistry
Hardware and Architecture
Etching (microfabrication)
Hexagonal lattice
Electrical and Electronic Engineering
business
Electron-beam lithography
Photonic crystal
Subjects
Details
- ISSN :
- 14321858 and 09467076
- Volume :
- 12
- Database :
- OpenAIRE
- Journal :
- Microsystem Technologies
- Accession number :
- edsair.doi...........f61e58f411fa0e4118e305e6f420a296