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Effects of negative low self-bias on hydrogenated amorphous carbon films deposited by PECVD technique
- Source :
- Diamond and Related Materials. 12:988-992
- Publication Year :
- 2003
- Publisher :
- Elsevier BV, 2003.
-
Abstract
- Hydrogenated amorphous carbon films (a-C:H) were deposited by plasma enhanced chemical vapour deposition using a planar RF discharge and pure methane gas. The influence of the negative self-bias (varying from 0 to 400 V) on physical properties is investigated. The density of the materials, characterized by X-ray reflectivity, varies from 1.3 to 1.8 g/cm 3 . The lowest density obtained for the grounded (0 V) film is related to the porosity. Curvature measurements reveal high compressive stress (2.6 GPa) for the film deposited with a self-bias close to 100 V. These different behaviours are related with the different structures (polymerlike, diamondlike, graphitelike) depending on the self-bias used during the deposition process. It is also shown that in spite of these different structures, the surface energies calculated from contact angle measurements using different liquids are similar whatever the used self-bias.
- Subjects :
- Materials science
Mechanical Engineering
Analytical chemistry
chemistry.chemical_element
Biasing
General Chemistry
Surface energy
Electronic, Optical and Magnetic Materials
Contact angle
Stress (mechanics)
chemistry
Amorphous carbon
Plasma-enhanced chemical vapor deposition
Materials Chemistry
Electrical and Electronic Engineering
Porosity
Carbon
Subjects
Details
- ISSN :
- 09259635
- Volume :
- 12
- Database :
- OpenAIRE
- Journal :
- Diamond and Related Materials
- Accession number :
- edsair.doi...........f764cab1f3a454269731ee3f4c43b6b0