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Adjustment of the band gap of co-doped KCl/NH4Cl/g-C3N4 for enhanced photocatalytic performance under visible light

Authors :
Lei Liu
Hengjun Gai
Yubao Tang
Tingting Huang
Xiaofei Qu
Haozhong Wang
Bingxiao Feng
Meng Xiao
Hongbing Song
Source :
Materials Science in Semiconductor Processing. 128:105757
Publication Year :
2021
Publisher :
Elsevier BV, 2021.

Abstract

The development of a photocatalyst with high activity, large specific surface area and precise band gap adjustment is the focus of the field of photocatalysis in realizing energy conversion and improving environmental issues. In this paper, a simple synthesis process for co-doping of KCl and NH4Cl to precisely adjust the band gap of g-C3N4 was developed. Various characterization results show that doping with KCl and NH4Cl can reduce the band gap of the carbon nitride, increase its visible light absorption, improve its carrier separation efficiency, thus showing good photocatalytic activity. Cl and K enter the g-C3N4 layers via intercalation and form a dual-element charge transport channel between these layers, thereby facilitating the transport of electrons. The introduction of NH4Cl increases the specific surface area of the composite, thus providing abundant adsorption and reaction sites. The co-loaded photocatalyst CN-NH4Cl-0.05KCl was used to degrade rhodamine B (RhB) and tetracycline (TC) and showed excellent photocatalytic activity. A possible mechanism of photocatalytic degradation is proposed based on the analytic results.

Details

ISSN :
13698001
Volume :
128
Database :
OpenAIRE
Journal :
Materials Science in Semiconductor Processing
Accession number :
edsair.doi...........f7c87412d74a51668428bcb1e6de5017