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Zinc ion implantation into GaAs0.62P0.38

Authors :
Tadatsugu Itoh
Yasuhisa Oana
Source :
Applied Physics Letters. 24:320-322
Publication Year :
1974
Publisher :
AIP Publishing, 1974.

Abstract

The effects of dose, implantation temperatures, and annealing on the electrical properties of Zn‐implanted GaAs0.62P0.38 were measured. Zinc ion implantation was performed with 20‐keV ions at temperatures between room temperature and 450 °C. The abnormal property that the effective surface concentration exceeds the implanted Zn dose was obtained for the samples implanted at room temperature.

Details

ISSN :
10773118 and 00036951
Volume :
24
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........f82f2b1a8cb7a41482de938f7e8e44c9
Full Text :
https://doi.org/10.1063/1.1655200