Response to 'Comment on ‘A model for internal photoemission at high-k oxide/silicon energy barriers’' [J. Appl. Phys. 113, 166101 (2013)]

Subjects

Subjects :

Materials science
Nanostructure
Silicon
Analytical chemistry
Oxide
General Physics and Astronomy
chemistry.chemical_element
Heterojunction
Molecular physics
chemistry.chemical_compound
chemistry
Caesium
Electron affinity
Energy (signal processing)
High-κ dielectric

Details

ISSN :

10897550 and 00218979

Volume :

113

Database :

OpenAIRE

Journal :

Journal of Applied Physics

Accession number :

edsair.doi...........f88b0ff9c3e5eed19c1bfd1754e90d9a

Full Text :

https://doi.org/10.1063/1.4802675