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Engineering of two-photon spatial quantum correlations behind a double slit

Authors :
Jelmer J. Renema
W. H. Peeters
M. P. van Exter
Source :
Physical Review A. 79
Publication Year :
2009
Publisher :
American Physical Society (APS), 2009.

Abstract

This paper demonstrates the engineering of spatially entangled two-photon states behind a double slit by tailoring the incident pure two-photon state. We experimentally characterize many different two-photon states by measuring their complete two-photon interference patterns in the far field of the double slit. Spatial entanglement right behind the double slit can reside in either the modulus or the phase of the two-photon field. The balance between these two types of entanglement is fully controlled by experimentally utilizing the phase-front curvatures of the pump beam and the phase-matching profile. We project either a far-field image or a magnified near-field image of the two-photon source onto the double slit. Our theoretical analysis shows how the two-photon interference pattern behind the double slit effectively acts as a phase-sensitive probe of the incident two-photon field profile. We thus present phase-sensitive measurements of the generated two-photon field profile probed in an image plane of the two-photon source.

Details

ISSN :
10941622 and 10502947
Volume :
79
Database :
OpenAIRE
Journal :
Physical Review A
Accession number :
edsair.doi...........f90ba2ef5e0edd4c3f14badd8561a453
Full Text :
https://doi.org/10.1103/physreva.79.043817