Optical emitters based on color centers in lithium fluoride exposed by soft x-ray radiation

The miniaturization of optical devices is a key objective in the field of photonics, and a large set of materials and techniques are under investigation. Among the former, lithium fluoride (LiF) is of particular interest because it is almost not hygroscopic and it can host stable color centers (CCs) produced by ionizing radiation and emitting in the visible spectral range even at room temperature (RT) under optical excitation. The increasing demand for low-dimensionality photonic devices imposes the utilization of advanced lithographic techniques for producing luminescent structures with submicrometric spatial resolution. We present an innovative irradiation method producing CCs in LiF crystals and films by using an EUV and soft X-ray laser-plasma source. This technique is able to produce colored patterns with high spatial resolution on large (more than 10 cm2) areas in a short exposure time compared with other irradiation methods. The colored LiF samples have been characterized by optical absorption and photoluminescence measurements for different irradiation fluences.