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Liquid immersion lens technology applied to laser voltage probing of 130 nm process technology devices

Liquid immersion lens technology applied to laser voltage probing of 130 nm process technology devices

Authors :
William Lo
Patrick Pardy
Travis Eiles
Herve Deslandes
Nagamani Nataraj
Source :
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:3067
Publication Year :
2002
Publisher :
American Vacuum Society, 2002.

Abstract

Liquid immersion lens technology has been applied to internal-node, through-silicon probing of 130 nm integrated circuits. A 100×, 1.3 numerical aperture (NA) objective with 100 μm working distance was specifically designed for this application. An optical resolution of 500 nm is achieved using 1064 nm wavelength light, ≈30% improvement over the standard, air immersion, 0.85 NA lens currently used. Significant improvements in wave form quality were also achieved. A >2× signal to noise ratio improvement is demonstrated on 130 nm technology devices. Probing of 90 nm technology devices indicate that laser voltage probing with liquid immersion lens technology and phase-sensitive detection is extensible to this process node.

Details

ISSN :
0734211X
Volume :
20
Database :
OpenAIRE
Journal :
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Accession number :
edsair.doi...........fe3ce834ef1ba501b0b4e511bce885ed
Full Text :
https://doi.org/10.1116/1.1523406