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Liquid immersion lens technology applied to laser voltage probing of 130 nm process technology devices
Liquid immersion lens technology applied to laser voltage probing of 130 nm process technology devices
- Source :
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:3067
- Publication Year :
- 2002
- Publisher :
- American Vacuum Society, 2002.
-
Abstract
- Liquid immersion lens technology has been applied to internal-node, through-silicon probing of 130 nm integrated circuits. A 100×, 1.3 numerical aperture (NA) objective with 100 μm working distance was specifically designed for this application. An optical resolution of 500 nm is achieved using 1064 nm wavelength light, ≈30% improvement over the standard, air immersion, 0.85 NA lens currently used. Significant improvements in wave form quality were also achieved. A >2× signal to noise ratio improvement is demonstrated on 130 nm technology devices. Probing of 90 nm technology devices indicate that laser voltage probing with liquid immersion lens technology and phase-sensitive detection is extensible to this process node.
Details
- ISSN :
- 0734211X
- Volume :
- 20
- Database :
- OpenAIRE
- Journal :
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Accession number :
- edsair.doi...........fe3ce834ef1ba501b0b4e511bce885ed
- Full Text :
- https://doi.org/10.1116/1.1523406