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A Universal Approach for Room-Temperature Printing and Coating of 2D Materials

Authors :
Mahdieh Shakoorioskooie
Frank Nüesch
René Schneider
Jakob Heier
Chuanfang John Zhang
Sina Abdolhosseinzadeh
Source :
Advanced Materials, 34 (4)
Publication Year :
2022
Publisher :
ETH Zurich, 2022.

Abstract

Processing 2D materials into printable or coatable inks for the fabrication of functional devices has proven to be quite difficult. Additives are often used in large concentrations to address the processing challenges, but they drastically degrade the electronic properties of the materials. To remove the additives a high-temperature post-deposition treatment can be used, but this complicates the fabrication process and limits the choice of materials (i.e., no heat-sensitive materials). In this work, by exploiting the unique properties of 2D materials, a universal strategy for the formulation of additive-free inks is developed, in which the roles of the additives are taken over by van der Waals (vdW) interactions. In this new class of inks, which is termed "vdW inks", solvents are dispersed within the interconnected network of 2D materials, minimizing the dispersibility-related limitations on solvent selection. Furthermore, flow behavior of the inks and mechanical properties of the resultant films are mainly controlled by the interflake vdW attractions. The structure of the vdW inks, their rheological properties, and film-formation behavior are discussed in detail. Large-scale production and formulation of the vdW inks for major high-throughput printing and coating methods, as well as their application for room-temperature fabrication of functional films/devices are demonstrated.<br />Advanced Materials, 34 (4)<br />ISSN:0935-9648<br />ISSN:1521-4095

Details

Language :
English
ISSN :
09359648 and 15214095
Database :
OpenAIRE
Journal :
Advanced Materials, 34 (4)
Accession number :
edsair.doi.dedup.....01c258744f95b95cbce084ae1bdfb1d8
Full Text :
https://doi.org/10.3929/ethz-b-000518884