Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating

We present a method to produce small pitch gratings for X-ray interferometric imaging applications, allowing the phase sensitivity to be increased and/or the length of the laboratory setup to be minimized. The method is based on fabrication of high aspect ratio silicon microstructures using deep reactive ion etching (Bosch technique) of dense grating arrays and followed by conformal electroplating of Au. We demonstrated that low resistivity Si substrates (
Micromachines, 12 (5)
ISSN:2072-666X