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Kondo physics in antiferromagnetic Weyl semimetal Mn3+xSn1-x films
- Publication Year :
- 2020
- Publisher :
- arXiv, 2020.
-
Abstract
- Topology and strong electron correlations are crucial ingredients in emerging quantum materials, yet their intersection in experimental systems has been relatively limited to date. Strongly correlated Weyl semimetals, particularly when magnetism is incorporated, offer a unique and fertile platform to explore emergent phenomena in novel topological matter and topological spintronics. The antiferromagnetic Weyl semimetal Mn3Sn exhibits many exotic physical properties such as a large spontaneous Hall effect and has recently attracted intense interest. In this work, we report synthesis of epitaxial Mn3+x Sn1-x films with greatly extended compositional range in comparison with that of bulk samples. As Sn atoms are replaced by magnetic Mn atoms, the Kondo effect, which is a celebrated example of strong correlations, emerges, develops coherence, and induces a hybridization energy gap. The magnetic doping and gap opening lead to rich extraordinary properties, as exemplified by the prominent DC Hall effects and resonance-enhanced terahertz Faraday rotation.
- Subjects :
- Magnetism
Weyl semimetal
FOS: Physical sciences
02 engineering and technology
01 natural sciences
symbols.namesake
Condensed Matter - Strongly Correlated Electrons
Hall effect
0103 physical sciences
Faraday effect
Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
Antiferromagnetism
010306 general physics
Physics
Condensed Matter - Materials Science
Multidisciplinary
Condensed matter physics
Spintronics
Condensed Matter - Mesoscale and Nanoscale Physics
Strongly Correlated Electrons (cond-mat.str-el)
Materials Science (cond-mat.mtrl-sci)
021001 nanoscience & nanotechnology
Semimetal
3. Good health
symbols
Condensed Matter::Strongly Correlated Electrons
Kondo effect
0210 nano-technology
Subjects
Details
- Database :
- OpenAIRE
- Accession number :
- edsair.doi.dedup.....07e1cd3b570e976ac27f66c635ea1177
- Full Text :
- https://doi.org/10.48550/arxiv.2007.02221