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Growth and properties of large-area sulfur-doped graphene films

Authors :
Binjie Zheng
Yuanfu Chen
Wanli Zhang
Zegao Wang
Jinhao Zhou
Yanrong Li
Jingbo Liu
Source :
Zhou, J, Wang, Z, Chen, Y, Liu, J, Zheng, B, Zhan, W & Li, Y 2017, ' Growth and properties of large-area sulfur-doped graphene films ', Journal of Materials Chemistry C, vol. 5, no. 31, pp. 7944-7949 . https://doi.org/10.1039/c7tc00447h
Publication Year :
2017
Publisher :
Royal Society of Chemistry (RSC), 2017.

Abstract

Heteroatom doping can effectively tune the structure and properties of graphene. Theoretical calculations indicate that sulfur doping can effectively modify the band structure and further modulate the carrier transport properties of graphene. However, it is still a big challenge to synthesize large-area sulfur-doped graphene (SG) films with a high sulfur doping concentration and reasonable electrical properties since sulfur has a much larger atomic radius than carbon. In this study, the solid organic source thianthrene (C12H8S2) is employed as both a carbon source and sulfur dopant to grow large-area, few-layered SG films via chemical vapor deposition (CVD). The results show that the doping concentration, doping configuration and electrical properties can be effectively tuned via the hydrogen flux. The sulfur doping concentration is as high as 4.01 at% and the maximal mobility of SG can reach up to 270 cm(2) V-1 s(-1), which are the highest ever reported for sulfur-doped graphene.

Details

ISSN :
20507534 and 20507526
Volume :
5
Database :
OpenAIRE
Journal :
Journal of Materials Chemistry C
Accession number :
edsair.doi.dedup.....0bdbc26062c9a5beeb4ccba5abd47d98