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Growth and properties of large-area sulfur-doped graphene films
- Source :
- Zhou, J, Wang, Z, Chen, Y, Liu, J, Zheng, B, Zhan, W & Li, Y 2017, ' Growth and properties of large-area sulfur-doped graphene films ', Journal of Materials Chemistry C, vol. 5, no. 31, pp. 7944-7949 . https://doi.org/10.1039/c7tc00447h
- Publication Year :
- 2017
- Publisher :
- Royal Society of Chemistry (RSC), 2017.
-
Abstract
- Heteroatom doping can effectively tune the structure and properties of graphene. Theoretical calculations indicate that sulfur doping can effectively modify the band structure and further modulate the carrier transport properties of graphene. However, it is still a big challenge to synthesize large-area sulfur-doped graphene (SG) films with a high sulfur doping concentration and reasonable electrical properties since sulfur has a much larger atomic radius than carbon. In this study, the solid organic source thianthrene (C12H8S2) is employed as both a carbon source and sulfur dopant to grow large-area, few-layered SG films via chemical vapor deposition (CVD). The results show that the doping concentration, doping configuration and electrical properties can be effectively tuned via the hydrogen flux. The sulfur doping concentration is as high as 4.01 at% and the maximal mobility of SG can reach up to 270 cm(2) V-1 s(-1), which are the highest ever reported for sulfur-doped graphene.
- Subjects :
- MECHANISM
Materials science
Inorganic chemistry
Heteroatom
chemistry.chemical_element
02 engineering and technology
Chemical vapor deposition
010402 general chemistry
CARBON NANOTUBES
01 natural sciences
law.invention
LOW-TEMPERATURE GROWTH
RAMAN-SPECTROSCOPY
law
Materials Chemistry
ELECTROCATALYST
Dopant
Graphene
Doping
ELECTRICAL-PROPERTIES
General Chemistry
NANOSHEETS
021001 nanoscience & nanotechnology
Sulfur
0104 chemical sciences
NITROGEN
CHEMICAL-VAPOR-DEPOSITION
Atomic radius
OXYGEN REDUCTION REACTION
chemistry
Chemical engineering
0210 nano-technology
Carbon
Subjects
Details
- ISSN :
- 20507534 and 20507526
- Volume :
- 5
- Database :
- OpenAIRE
- Journal :
- Journal of Materials Chemistry C
- Accession number :
- edsair.doi.dedup.....0bdbc26062c9a5beeb4ccba5abd47d98