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Pushing the limits: an instrument for hard X-ray imaging below 20 nm

Authors :
Nathalie Bouet
Yong S. Chu
Hanfei Yan
Raymond Conley
Xiaojing Huang
Evgeny Nazaretski
Sebastian Kalbfleisch
Ming Lu
Ulrich Wagner
Juan Zhou
Kenneth Lauer
Christoph Rau
Kazimierz Gofron
Wei Xu
Source :
Journal of Synchrotron Radiation. 22:336-341
Publication Year :
2015
Publisher :
International Union of Crystallography (IUCr), 2015.

Abstract

Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10 nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2 nm h−1accompanied by 13 nm × 33 nm imaging resolution at 11.8 keV are reported.

Details

ISSN :
16005775
Volume :
22
Database :
OpenAIRE
Journal :
Journal of Synchrotron Radiation
Accession number :
edsair.doi.dedup.....0c3143196b9aa875ef90e8700663d749
Full Text :
https://doi.org/10.1107/s1600577514025715