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Engineering block copolymer materials for patterning ultra-low dimensions
- Source :
- Molecular Systems Design & Engineering, Molecular Systems Design & Engineering, RSC, 2020, pp.DOI: 10.1039/D0ME00118J. ⟨10.1039/D0ME00118J⟩, Molecular Systems Design & Engineering, 2020, pp.DOI: 10.1039/D0ME00118J. ⟨10.1039/D0ME00118J⟩
- Publication Year :
- 2020
- Publisher :
- Royal Society of Chemistry (RSC), 2020.
-
Abstract
- International audience; The landscape of block copolymer (BCP) lithographic patterning has evolved significantly from the early days of the first generation BCP material, poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA). The low Flory–Huggins interaction parameter (χ) of the workhorse material PS-b-PMMA prevents ultra-low dimensional scaling (
- Subjects :
- Materials science
Silicon
Biomedical Engineering
Energy Engineering and Power Technology
chemistry.chemical_element
Nanotechnology
02 engineering and technology
010402 general chemistry
01 natural sciences
Industrial and Manufacturing Engineering
Nanomanufacturing
Materials Chemistry
Copolymer
Chemical Engineering (miscellaneous)
Thin film
Scaling
Lithography
Process Chemistry and Technology
[CHIM.MATE]Chemical Sciences/Material chemistry
021001 nanoscience & nanotechnology
0104 chemical sciences
[CHIM.POLY]Chemical Sciences/Polymers
Nanolithography
chemistry
Polymerization
Chemistry (miscellaneous)
0210 nano-technology
Subjects
Details
- ISSN :
- 20589689
- Volume :
- 5
- Database :
- OpenAIRE
- Journal :
- Molecular Systems Design & Engineering
- Accession number :
- edsair.doi.dedup.....0cd2e626f684d9178b88c49742965027
- Full Text :
- https://doi.org/10.1039/d0me00118j