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Ultra high hole mobilities in a pure strained Ge quantum well
- Source :
- Thin Solid Films 557(2014), 329-333
- Publication Year :
- 2014
- Publisher :
- Elsevier BV, 2014.
-
Abstract
- Hole mobilities at low and room temperature (RT) have been studied for a strained sGe/SiGe heterostructure using standard Van der Pauw resistivity and Hall effect measurements. The range of magnetic field and temperatures used were - 14 T < B < + 14 T and 1.5 K < T < 300 K respectively. Using maximum entropy-mobility spectrum analysis (ME-MSA) and Bryan's algorithm mobility spectrum (BAMS) analysis, a RT two dimensional hole gas drift mobility of (3.9 ± 0.4) × 103 cm2/V s was determined for a sheet density (ps) 9.8 × 1010 cm− 2 (by ME-MSA) and (3.9 ± 0.2) × 103 cm2/V s for a sheet density (ps) 5.9 × 1010 cm− 2 (by BAMS).
- Subjects :
- Physics
Electron mobility
Condensed matter physics
Drift mobility
Metals and Alloys
Analytical chemistry
Heterojunction
Surfaces and Interfaces
7. Clean energy
Strained Ge
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Magnetic field
ME-MSA
Surface coating
Van der Pauw method
Ge QW channel
Electrical resistivity and conductivity
Hall effect
Materials Chemistry
QC
BAMS
Quantum well
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 557
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi.dedup.....1b783d49d490b0be1fb51954298253a9