Origins of wear-induced tungsten corrosion defects in semiconductor manufacturing during tungsten chemical mechanical polishing

Authors :: Seung-Hoon Choi
Melissa E. Kreider
Adam C. Nielander
Michaela Burke Stevens
Gaurav Ashish Kamat
Ja Eung Koo
Ki Ho Bae
Hoyoung Kim
Il Young Yoon
Bo Un Yoon
Kihyun Hwang
Dong Un Lee
Thomas F. Jaramillo
Source :: Applied Surface Science. 598:153767
Publication Year :: 2022
Publisher :: Elsevier BV, 2022.

Subjects :: History
Polymers and Plastics
General Physics and Astronomy
Surfaces and Interfaces
General Chemistry
Business and International Management
Condensed Matter Physics
Industrial and Manufacturing Engineering
Surfaces, Coatings and Films

Tools