Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels

MLA

Mikko Utriainen, et al. Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels. Sept. 2020. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....27c90ead4a2761be5e82527e1771bdfb&authtype=sso&custid=ns315887.

APA

Mikko Utriainen, Riikka L. Puurunen, Oili Ylivaara, Markku Ylilammi, Virpi Korpelainen, Eero Haimi, Emma Verkama, & Jihong Yim. (2020). Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels.

Chicago

Mikko Utriainen, Riikka L. Puurunen, Oili Ylivaara, Markku Ylilammi, Virpi Korpelainen, Eero Haimi, Emma Verkama, and Jihong Yim. 2020. “Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels,” September. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....27c90ead4a2761be5e82527e1771bdfb&authtype=sso&custid=ns315887.